Optimizing noise for defect analysis with through-focus scanning optical microscopy
| Autor: | Ravikiran Attota, John A. Kramar |
|---|---|
| Rok vydání: | 2017 |
| Předmět: |
Data processing
Materials science business.industry Noise (signal processing) 02 engineering and technology TSOM 021001 nanoscience & nanotechnology 01 natural sciences Article Metrology law.invention 010309 optics Optics Nanometrology Optical microscope law 0103 physical sciences Sensitivity (control systems) 0210 nano-technology business Focus (optics) |
| Zdroj: | Proceedings of SPIE--the International Society for Optical Engineering. 9778 |
| ISSN: | 0277-786X |
| Popis: | Through-focus scanning optical microscopy (TSOM) shows promise for patterned defect analysis, but it is important to minimize total system noise. TSOM is a three-dimensional shape metrology method that can achieve sub-nanometer measurement sensitivity by analyzing sets of images acquired through-focus using a conventional optical microscope. Here we present a systematic noise-analysis study for optimizing data collection and data processing parameters for TSOM and then demonstrate how the optimized parameters affect defect analysis. We show that the best balance between signal-to-noise performance and acquisition time can be achieved by judicious spatial averaging. Correct background-signal subtraction of the imaging-system inhomogeneities is also critical, as well as careful alignment of the constituent images used in differential TSOM analysis. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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