Reliability of a focused ion beam repair on digital CMOS circuits
| Autor: | K. Van Doorselaer, R.M. Van Camp, I. Clemminck |
|---|---|
| Rok vydání: | 2005 |
| Předmět: |
Engineering
business.industry System testing Integrated circuit Condensed Matter Physics Focused ion beam Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials law.invention CMOS law Electronic engineering Electrical and Electronic Engineering Safety Risk Reliability and Quality business Reliability (statistics) Degradation (telecommunications) Electronic circuit |
| Zdroj: | Proceedings of the 7th European Symposium on Reliability of Electron Devices, Failure Physics and Analysis. |
| Popis: | The usefulness of FIB technology for device modification is commonly recognized in the industry. Yet, very little is known concerning the reliability of these circuit changes. This paper presents the reliability assessment of a "standard" FIB repair on digital CMOS circuits. The overall conclusion is positive : the lifetime of a "standard" FIB repair is found to be more than a few months, which is largely sufficient for prototyping. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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