Effect of Multilayer versus Monolayer Dodecanethiol on Selectivity and Pattern Integrity in Area-Selective Atomic Layer Deposition
| Autor: | Dennis M. Hausmann, Katie Lynn Nardi, Nerissa Draeger, Tzu-Ling Liu, Stacey F. Bent |
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| Rok vydání: | 2020 |
| Předmět: |
Materials science
Vapor phase chemistry.chemical_element 02 engineering and technology 010402 general chemistry 021001 nanoscience & nanotechnology 01 natural sciences Copper 0104 chemical sciences Atomic layer deposition chemistry Chemical engineering Oxidation state Monolayer General Materials Science 0210 nano-technology Selectivity |
| Zdroj: | ACS Applied Materials & Interfaces. 12:42226-42235 |
| ISSN: | 1944-8252 1944-8244 |
| Popis: | Monolayer and multilayer dodecanethiols (DDT) can be assembled onto a copper surface from the vapor phase depending on the initial oxidation state of the copper. The ability of the copper-bound dodecanethiolates to block atomic layer deposition (ALD) and the resulting behavior at the interfaces of Cu/SiO |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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