Experimental and numerical investigation of biosensors plasmonic substrates induced differences by e-beam, soft and hard UV-NIL fabrication techniques
| Autor: | M. Lamy de la Chapelle, Mondher Besbes, J-F. Bryche, Julien Moreau, Michael Canva, Philippe Gogol, Frédéric Hamouda, Bernard Bartenlian |
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| Přispěvatelé: | Laboratoire Nanotechnologies Nanosystèmes (LN2 ), Université Grenoble Alpes [2016-2019] (UGA [2016-2019])-École Centrale de Lyon (ECL), Université de Lyon-Université de Lyon-Institut National des Sciences Appliquées de Lyon (INSA Lyon), Université de Lyon-Institut National des Sciences Appliquées (INSA)-Institut National des Sciences Appliquées (INSA)-Université de Sherbrooke (UdeS)-École supérieure de Chimie Physique Electronique de Lyon (CPE)-Centre National de la Recherche Scientifique (CNRS), Centre de Nanosciences et Nanotechnologies (C2N (UMR_9001)), Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS), Laboratoire Charles Fabry / Biophotonique, Laboratoire Charles Fabry (LCF), Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS)-Université Paris-Sud - Paris 11 (UP11)-Centre National de la Recherche Scientifique (CNRS)-Institut d'Optique Graduate School (IOGS), Institut des Molécules et Matériaux du Mans (IMMM), Le Mans Université (UM)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS) |
| Rok vydání: | 2019 |
| Předmět: |
Materials science
Fabrication lcsh:TK7800-8360 02 engineering and technology 010402 general chemistry 01 natural sciences Nanoimprint lithography law.invention symbols.namesake E-beam lithography law lcsh:Technology (General) [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics Electrical and Electronic Engineering Lithography Plasmon SERS business.industry SPRI lcsh:Electronics 021001 nanoscience & nanotechnology Condensed Matter Physics Atomic and Molecular Physics and Optics 0104 chemical sciences Surfaces Coatings and Films Electronic Optical and Magnetic Materials Characterization (materials science) [SPI.OPTI]Engineering Sciences [physics]/Optics / Photonic symbols lcsh:T1-995 Plasmonics Optoelectronics UV-NIL 0210 nano-technology business Biosensor Electron-beam lithography Raman scattering |
| Zdroj: | Micro and Nano Engineering Micro and Nano Engineering, Elsevier, 2019, 2, pp.122-130. ⟨10.1016/j.mne.2018.11.003⟩ Micro and Nano Engineering, Vol 2, Iss, Pp 122-130 (2019) |
| ISSN: | 2590-0072 |
| Popis: | This paper compares plasmonic substrates manufactured by three lithography methods: E-beam, soft and hard UV NanoImprint Lithography. The different plasmonic modes existing in samples made of an array of gold nanostructures on gold film are investigated for biochemical detections taking advantage of Surface Plasmon Resonance Imaging (SPRI) and Surface-Enhanced Raman Scattering (SERS). Recently, it has been shown that this geometry of substrate is of great interest for both SPRI and SERS measurements. A comparison of their performances obtained by the different lithographic methods is provided. In particular, due to limitations in NanoImprint Lithographic techniques, the impact of sidewall geometry of nanostructures is investigated in regard to plasmonic properties. Thus, experimental optical characterization analyses have been carried out on samples and compared with the numerical simulations. Keywords: Plasmonics, E-beam lithography, Nanoimprint lithography, UV-NIL, SPRI, SERS |
| Databáze: | OpenAIRE |
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