Growth and characterization of HTSC thin films for microelectronic devices

Autor:	Maryline Guilloux-Viry, Xavier Castel, C. Le Paven-Thivet, André Perrin
Rok vydání:	1996
Předmět:	Diffraction Materials science Electron diffraction business.industry General Engineering Optoelectronics Microelectronics Thin film Microstructure business Channelling Sheet resistance Characterization (materials science)
Zdroj:	Scopus-Elsevier
ISSN:	0026-2692
DOI:	10.1016/0026-2692(95)00061-5
Popis:	General techniques for the growth of heteroepitaxial HTSC thin films are shortly reviewed, and some recent trends are emphasized. The crystallographic characterization of such films is described in detail, including various X-ray diffraction settings, as well as electron diffraction and channelling methods. Among physical characterizations, the microwave measurements are highly defect sensitive, and a clear correlation between the microstructure, the a.c. susceptibility losses and the surface resistance is reported. Finally, main trends about potential applications are given.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::dc69b4dff3af34ef5e6510b9ac38cc57 https://doi.org/10.1016/0026-2692(95)00061-5 Zobrazit plný text záznamu Full Text from ScienceDirect