Comparison of Two Alternative Silicon-on-Glass Microfabrication Processes for MEMS Inertial Sensors
| Autor: | Said Emre Alper, Tayfun Akin, Mustafa Mert Torunbalci, Erdinc Tatar |
|---|---|
| Rok vydání: | 2011 |
| Předmět: |
Microelectromechanical systems
Silicon-On-Glass (SOG) process Materials science Silicon business.industry chemistry.chemical_element Silicon on insulator General Medicine chemistry Mask set MEMS inertial sensors Electronic engineering Deep reactive-ion etching Optoelectronics Wafer business Critical dimension Engineering(all) Microfabrication |
| Zdroj: | Procedia Engineering. 25:900-903 |
| ISSN: | 1877-7058 |
| DOI: | 10.1016/j.proeng.2011.12.221 |
| Popis: | This paper presents experimental comparison of a modified silicon-on-glass (M-SOG) process to a previously-reported classical SOG (C-SOG) process based on the use of SOI wafers, yielding a stress free silicon structural layer with desired structure thickness. The basic difference between these processes is the sequence of the step at which the silicon microstructures are defined by DRIE, making M-SOG more robust against critical dimension (CD) variations. Overall, M-SOG provides a simple, high yield, reliable, and robust solution for producing high performance MEMS inertial sensors, and these advantages are experimentally verified over C-SOG, both completed by following the identical process parameters and by using the same mask set. |
| Databáze: | OpenAIRE |
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