Plasma-free Dry-chemical Texturing Process for High-efficiency Multicrystalline Silicon Solar Cells
| Autor: | Ralf Preu, Bishal Kafle, Jochen Rentsch, Laurent Clochard, Pierre Saint-Cast, Marc Hofmann, Edward Duffy, Timo Freund, Abdul Mannan, Sabrina Werner |
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| Přispěvatelé: | Publica |
| Rok vydání: | 2016 |
| Předmět: |
Materials science
Silicon Passivation chemistry.chemical_element Nanotechnology 02 engineering and technology 01 natural sciences Pilotherstellung von industrienahen Solarzellen chemistry.chemical_compound atmospheric pressure Energy(all) Etching (microfabrication) Plasma-enhanced chemical vapor deposition dry texturing 0103 physical sciences Nanotextured Surfaces surface passivation 010302 applied physics business.industry black silicon Black silicon nanotexture 021001 nanoscience & nanotechnology Silicium-Photovoltaik solar cell silicon nitride Silicon nitride chemistry Photovoltaik emitter recombination Optoelectronics Surface modification PV Produktionstechnologie und Qualitätssicherung 0210 nano-technology business texture |
| Zdroj: | Energy Procedia. 92:359-368 |
| ISSN: | 1876-6102 |
| DOI: | 10.1016/j.egypro.2016.07.113 |
| Popis: | In this paper, we study the influence of modifying the geometry of nanotexture on its electrical properties. Nanotexture is formed by an industrially feasible dry-chemical etching process performed entirely in atmospheric pressure conditions. A surface modification process is developed that allows low surface recombination velocities ( S eff,min ≤ 10 cm/s) on nanotextured surfaces. By simultaneously improving the surface passivation and the emitter diffusion processes, we achieve an equivalent passivation level ( V OC,impl ≥ 670 mV) for nanotextured surfaces to that of reference textured surfaces after applying either PECVD or ALD based deposition techniques. |
| Databáze: | OpenAIRE |
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