A New Method of Fixing High-Aspect-Ratio Microstructures by Gel
| Autor: | Shuangyue Hou, Chen Nan, Xiangyu Chen, Yangchao Tian, Gang Liu, Xiaobo Zhang, Penghui Xiong, Ying Xiong |
|---|---|
| Jazyk: | angličtina |
| Rok vydání: | 2016 |
| Předmět: |
gel
Fabrication Materials science Capillary action Gel time Flatness (systems theory) lcsh:Mechanical engineering and machinery Nanotechnology fix 02 engineering and technology 01 natural sciences Article high-aspect-ratio microstructures 0103 physical sciences lcsh:TJ1-1570 Electrical and Electronic Engineering Composite material 010302 applied physics Mechanical Engineering 021001 nanoscience & nanotechnology Microstructure Control and Systems Engineering Scientific method 0210 nano-technology Layer (electronics) Microfabrication |
| Zdroj: | Micromachines; Volume 7; Issue 7; Pages: 115 Micromachines, Vol 7, Iss 7, p 115 (2016) Micromachines |
| ISSN: | 2072-666X |
| DOI: | 10.3390/mi7070115 |
| Popis: | In the microfabrication processes, it is necessary to examine the quality of the structures to ensure the whole process runs smoothly. However, the examination process of pattern defects is interrupted during the fabrication of high-aspect-ratio microstructures. The inevitable pattern defects arise from capillary forces which occur during the liquid drying process. In this paper, a new method that enables us to fix the microstructures with gel to restrict deformations before the rinsed liquid drying process has been proposed. It is effective to avoid the capillary forces by preventing the formation of the liquid level. The process parameters, types of gel, gel time and observation time were discussed and the flatness and thickness of the gel layer could be controlled. A series of high-aspect-ratio microstructures were fixed in good condition by gel. |
| Databáze: | OpenAIRE |
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