Marbled texture of sputtered Al/Si alloy thin film on Si
| Autor: | Gentile, MATTIA GIANFRANCO, Muñoz, Tabares, J. A., Chiodoni, A., Sgorlon, C., Para, I., Carta, R., Richieri, G., Bejtka, K., Merlin, L., Vittone, Ettore |
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| Rok vydání: | 2016 |
| Předmět: |
Materials Chemistry2506 Metals and Alloys
Silicon Materials science Thin films chemistry.chemical_element 02 engineering and technology Substrate (electronics) engineering.material 01 natural sciences Coatings and Films Surface roughness Coating Sputtering 0103 physical sciences Electronic Materials Chemistry Optical and Magnetic Materials Texture (crystalline) Thin film 010302 applied physics business.industry Metallurgy Metals and Alloys Light scattering Surfaces and Interfaces Sputter deposition 021001 nanoscience & nanotechnology Microstructure Heteroepitaxy X-ray diffraction Surfaces Coatings and Films Electronic Optical and Magnetic Materials Surfaces chemistry Aluminum silicon alloy engineering Transmission electron microscopy 2506 Optoelectronics 0210 nano-technology business |
| Zdroj: | Thin Solid Films. 612:165-171 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/j.tsf.2016.05.057 |
| Popis: | DC magnetron sputtering is a commonly used technique for the fabrication of silicon based electronic devices, since it provides high deposition rates and uniform large area metallization. However, in addition to the thickness uniformity, coating optical uniformity is a crucial need for semiconductor industrial processes, due to the wide use of optical recognition tools. In the silicon-based technology, aluminum is one of the most used materials for the metal contact. Both the pre-deposition substrate cleaning and the sputtering conditions determine the quality and the crystalline properties of the final Al deposited film. In this paper is shown that not all the mentioned conditions lead to good quality and uniform Al films. In particular, it is shown that under certain standard process conditions, Al/Si alloy (1% Si) metallization on a [100] Si presents a non-uniform reflectivity, with a marbled texture caused by flakes with milky appearance. This optical inhomogeneity is found to be caused by the coexistence of randomly orient Al/Si crystal, with heteroepitaxial Al/Si crystals, both grown on Si substrate. Based on the microstructural analysis, some strategies to mitigate or suppress this marbled texture of the Al thin film are proposed and discussed. |
| Databáze: | OpenAIRE |
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