Osteoblast growth on titanium foils coated with hydroxyapatite by pulsed laser ablation
Autor: | W.-J Lo, M. D. Ball, S. Downes, V. N. Bagratashvili, E. N. Antonov, Vladimir K. Popov, David M. Grant, Colin A. Scotchford, Steven M. Howdle |
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Rok vydání: | 2001 |
Předmět: |
Materials science
Biophysics Analytical chemistry chemistry.chemical_element Bioengineering Fluence law.invention Biomaterials Crystallinity X-Ray Diffraction law medicine Thin film Titanium Osteoblasts Thin layers Lasers Biomaterial Osteoblast Alkaline Phosphatase Laser Durapatite Phenotype medicine.anatomical_structure chemistry Mechanics of Materials Ceramics and Composites Cell Division |
Zdroj: | Biomaterials. 22:337-347 |
ISSN: | 0142-9612 |
DOI: | 10.1016/s0142-9612(00)00189-7 |
Popis: | Pulsed laser ablation is a new method for deposition of thin layers of hydroxyapatite (HA) on to biomaterial surfaces. In this paper, we report activity and morphology of osteoblasts grown on HA surfaces fabricated using different laser conditions. Two sets of films were deposited from dense HA targets, at three different laser fluences: 3, 6 and 9 Jcm(-2). One set of the surfaces was annealed at 575 degrees C to increase the crystallinity of the deposited films. Primary human osteoblasts were seeded onto the material surfaces and cytoskeletal actin organisation was examined using confocal laser scanning microscopy. The annealed surfaces supported greater cell attachment and more defined cytoskeletal actin organisation. Cell activity, measured using the alamar Blue assay, was also found to be significantly higher on the annealed samples. In addition, our results show distinct trends that correlate with the laser fluence used for deposition. The cell activity increases with increasing fluence. This pattern was repeated for alkaline phosphatase production by the cells. Differences in cell spreading were apparent which were correlated with the fluence used to deposit the HA. The optimum surface for initial attachment and spreading of osteoblasts was one of the HA films deposited using 9 J cm(-2) laser fluence and subsequently annealed at 575 degrees C. |
Databáze: | OpenAIRE |
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