| Autor: |
Roland Schmechel, Ralf Theissmann, Simon Bubel, Claudia Busch |
| Rok vydání: |
2012 |
| Předmět: |
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| Zdroj: |
Nanoparticles from the Gasphase ISBN: 9783642285455 |
| DOI: |
10.1007/978-3-642-28546-2_15 |
| Popis: |
This article compares several non-vacuum-based low-temperature deposition techniques of semiconducting oxides for thin-film transistor applications. After an introduction into basic thin-film transistor theory it summarizes in short the development in the field of semiconducting oxides. Three different deposition techniques are considered in more detail: (1) a direct deposition of semiconducting oxide nanoparticles from a carrier gas stream, on the example of SnO\(_{x}\) and In\(_{2}\)O\(_{3}\), (2) a wet-deposition of nanodispersions of ZnO, and (3) a deposition of liquid precursors with subsequent transformation into the semiconducting oxide, on the example of ZnO. The advantages and disadvantages of the several methods are discussed critically also with respect to results from the literature. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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