Analysis of the Sensing Margin of Silicon and Poly-Si 1T-DRAM

Autor: Wookyung Sun, Seongjae Cho, Songyi Yoo, In Man Kang, Hyeonjeong Kim, Hyungsoon Shin
Jazyk: angličtina
Rok vydání: 2020
Předmět:
Zdroj: Micromachines
Micromachines, Vol 11, Iss 2, p 228 (2020)
Volume 11
Issue 2
ISSN: 2072-666X
Popis: Recently, one-transistor dynamic random-access memory (1T-DRAM) cells having a polysilicon body (poly-Si 1T-DRAM) have attracted attention as candidates to replace conventional one-transistor one-capacitor dynamic random-access memory (1T-1C DRAM). Poly-Si 1T-DRAM enables the cost-effective implementation of a silicon-on-insulator (SOI) structure and a three-dimensional (3D) stacked architecture for increasing integration density. However, studies on the transient characteristics of poly-Si 1T-DRAM are still lacking. In this paper, with TCAD simulation, we examine the differences between the memory mechanisms in poly-Si and silicon body 1T-DRAM. A silicon 1T-DRAM cell&rsquo
s data state is determined by the number of holes stored in a floating body (FB), while a poly-Si 1T-DRAM cell&rsquo
s state depends on the number of electrons trapped in its grain boundary (GB). This means that a poly-Si 1T-DRAM can perform memory operations by using GB as a storage region in thin body devices with a small FB area.
Databáze: OpenAIRE