Stability of polydihydrosilane liquid films on solid substrates
| Autor: | Yasuo Matsuki, Takashi Masuda, Tatsuya Shimoda |
|---|---|
| Rok vydání: | 2012 |
| Předmět: |
Liquid film
Fabrication Materials science Silicon Hamaker constant Analytical chemistry chemistry.chemical_element Nanotechnology law.invention chemistry.chemical_compound Solid substrate Optical microscope Polysilane law Materials Chemistry Polydihydrosilane van der Waals energy Micrograph Metals and Alloys Surfaces and Interfaces Surfaces Coatings and Films Electronic Optical and Magnetic Materials chemistry |
| Zdroj: | Thin Solid Films. 520:5091-5096 |
| ISSN: | 0040-6090 |
| Popis: | The quality of polydihydrosilane liquid films is a key factor in the fabrication of solution-processed silicon films. This study investigates the stability of polydihydrosilane liquid films with a thickness L of ～ 40 nm on solid substrates by a comparison between the observed optical microscope images and the values of the Hamaker constant A_ for the air/liquid (polydihydrosilane)/solid substrate systems. A_ values for a series of SiO_2-based substrates were determined by adopting a simple spectrum method. We found that the micrographs of the polydihydrosilane films provide direct evidence of stability in accordance with the sign of A_; a stable liquid film with A_ > 0 showed a continuous figure, while an unstable film with A_ < 0 exhibited an array of dots caused by the rupture of the film. The array of dots in the unstable liquid films has a slight orderly distribution with a period λ that is in accord with the characteristic wavelength of the undulation related to the spinodal-like decomposition in van der Waals unstable liquid. |
| Databáze: | OpenAIRE |
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