Pulsed arc deposition of super-hard amorphous carbon films

Autor:	H.-J. Scheibe, H. Schulz, B. Schultrich, P. Siemroth
Přispěvatelé:	Publica
Rok vydání:	2004
Předmět:	Materials science Metallurgy chemistry.chemical_element General Chemistry Plasma Pulsed laser deposition Arc (geometry) Carbon film Amorphous carbon chemistry Cathodic arc deposition Deposition (phase transition) General Materials Science Composite material Carbon
Zdroj:	Applied Physics A: Materials Science & Processing. 78:675-679
ISSN:	1432-0630 0947-8396
Popis:	Hydrogen-free amorphous carbon films with hardness up to 75 GPa have been deposited by special pulsed arc techniques. The influence of plasma and deposition conditions on the film properties is discussed and some applications are shown.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b264b25b58f96f57a968d09815f24687 https://doi.org/10.1007/s00339-003-2280-8 Zobrazit plný text záznamu Plný text ve formátu PDF