Silane Deposition via Gas-Phase Evaporation and High-Resolution Surface Characterization of the Ultrathin Siloxane Coatings
| Autor: | Felix Hempel, Xiaoling Lu, Walid-Madhat Munief, Miriam Schwartz, Michael Schmitt, Sven Ingebrandt, Florian Heib, Vivek Pachauri, Rolf Hempelmann |
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| Rok vydání: | 2018 |
| Předmět: |
Silanes
Materials science 02 engineering and technology Surfaces and Interfaces Substrate (electronics) 010402 general chemistry 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Silane Evaporation (deposition) 0104 chemical sciences chemistry.chemical_compound chemistry Chemical engineering Silanization Siloxane Electrochemistry Surface modification General Materials Science 0210 nano-technology Layer (electronics) Spectroscopy |
| Zdroj: | Langmuir : the ACS journal of surfaces and colloids. 34(35) |
| ISSN: | 1520-5827 |
| Popis: | Siloxane coatings for surfaces are essential in many scientific and industrial applications. We describe a straightforward gas-phase evaporation technique in inert atmosphere and introduce a practical and reliable silanization protocol adaptable to different silane types. The primary aim of depositing ultrathin siloxane films on surfaces is to enable a reproducible and homogenous surface functionalization without agglomeration effects during the layer formation. To realize high-quality and large-area coatings, it is fundamental to understand the reaction conditions of the silanes, the process of the siloxane layer formation, and the possible influence of the substrate morphology. We used three typical silane types to exemplify the potential and versatility of our process: aminopropyltriethoxysilane, glycidoxypropyltrimethoxysilane, and 1 H,1 H,2 H,2 H-perfluorooctyl-trichlorosilane. The ultrathin siloxane layers, which are generally difficult to characterize, were precisely investigated with high-resolution surface-characterization methods to verify our concept in terms of reproducibility and coating quality. Our results show that this gas-phase evaporation protocol is easily adaptable to all three, widely used silane types also enabling a large-area upscale. |
| Databáze: | OpenAIRE |
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