Effect of V Addition on Microstructure and Properties of Cu-1.6Ni-1.2Co-0.65Si Alloys

Autor: Fangxin Yu, Jinfeng Zou, Jian Xie, Jianyi Cheng, Guangbo Feng
Rok vydání: 2019
Předmět:
Zdroj: Metals, Vol 9, Iss 6, p 679 (2019)
Metals
Volume 9
Issue 6
ISSN: 2075-4701
DOI: 10.3390/met9060679
Popis: To obtain high strength and high electrical conductivity at the same time, the microstructure and properties of 0.2 wt.% V-added, 0.1 wt.% V-added and V-free Cu-1.6Ni-1.2Co-0.65Si(-V) alloys were investigated. We examined with electrical conductivity and hardness measurements, tensile test, optical microscope and transmission electron microscope (TEM). The results show that Cu-1.6Ni-1.2Co-0.65Si-0.1V alloy obtains excellent combination properties: electrical conductivity is 46.12% IACS, hardness is 293.88 Hv, and tensile strength is 782 MPa, which are produced by 65% cold rolling + aging at 500 °
C for 480 min. The addition of vanadium (V) can accelerate the precipitation of solute atoms from the copper matrix, improve the hardness and electrical conductivity of Cu-1.6Ni-1.2Co-0.65Si alloys, and greatly accelerated the aging response. &delta
(Co,Ni)2Si and &beta
Ni3Si phases are detected in Cu-1.6Ni-1.2Co-0.65Si-0.1V alloy. The Orowan mechanism and grain boundary strengthening play a major role in the yield strength strengthening due to &delta
(Co,Ni)2Si phase.
Databáze: OpenAIRE