Subsurface damage measurement of ground fused silica parts by HF etching techniques
Autor: | Philippe Cormont, O. Rondeau, J. Destribats, C. Ambard, N. Darbois, C. Luitot, Jérôme Néauport |
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Přispěvatelé: | Centre d'études scientifiques et techniques d'Aquitaine (CESTA), Direction des Applications Militaires (DAM), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), CEA Le Ripault (CEA Le Ripault) |
Rok vydání: | 2009 |
Předmět: |
Materials science
Surface Properties Polishing 02 engineering and technology 01 natural sciences Hydrofluoric Acid law.invention 010309 optics Optics law Etching (microfabrication) Optical materials 0103 physical sciences Materials Testing White light interferometry [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics] Lasers and laser optics: laser damage Acid etching High power lasers business.industry Lasers 021001 nanoscience & nanotechnology Laser Silicon Dioxide Atomic and Molecular Physics and Optics Characterization (materials science) [SPI.OPTI]Engineering Sciences [physics]/Optics / Photonic 0210 nano-technology business Optical design and fabrication: polishing |
Zdroj: | Optics Express Optics Express, Optical Society of America-OSA Publishing, 2009, 17, pp.20448-20456. ⟨10.1364/OE.17.020448⟩ Optics Express, 2009, 17, pp.20448-20456. ⟨10.1364/OE.17.020448⟩ |
ISSN: | 1094-4087 |
Popis: | International audience; Detection and measurement of subsurface damage of ground optical surfaces are of major concern in the assessment of high damage thresholds fused silica optics for high power laser applications. We herein detail a new principle of SSD measurement based on the utilization of HF acid etching. We also review and compare different subsurface damage (SSD) characterization techniques applied to ground and fine ground fused silica samples. We demonstrate good concordance between the different measurements. |
Databáze: | OpenAIRE |
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