Optical imaging and image analysis for high aspect ratio NEMS
| Autor: | Oleksiy Sydoruk, Adam Bouchaala, D Liu, Richard R. A. Syms |
|---|---|
| Jazyk: | angličtina |
| Rok vydání: | 2018 |
| Předmět: |
COUPLED-WAVE ANALYSIS
Technology EXTRACTION Silicon chemistry.chemical_element Edge detection 09 Engineering Image (mathematics) Physics Applied NEMS Optical imaging Engineering THRESHOLDING TECHNIQUES 10 Technology Computer vision Electrical and Electronic Engineering Nanoscience & Nanotechnology SILICON Instruments & Instrumentation image segmentation Microelectromechanical systems Nanoelectromechanical systems Science & Technology business.industry Mechanical Engineering Physics EDGE-DETECTION ALGORITHMS Engineering Electrical & Electronic Image segmentation Condensed Matter::Mesoscopic Systems and Quantum Hall Effect Electronic Optical and Magnetic Materials sub-wavelength imaging MEMS chemistry Mechanics of Materials Physical Sciences Science & Technology - Other Topics THICK LAYERS Artificial intelligence GRATING DIFFRACTION business |
| Popis: | A strategy for optical microscopy of high-aspect-ratio (HAR) nanoelectromechanical systems (NEMS) that combine large feature spacing and large height with sub-wavelength width is presented. Line images are simulated using a 2D model of incoherent imaging based on modal diffraction theory. Beyond a sufficient depth, it is shown that sub-wavelength features appear as dark lines, while wider features are visible as their edges. The results suggest NEMS and MEMS may be separated from background in images by detection of valleys in brightness. Results are confirmed by imaging of Si NEMS containing 100 nm wide features in a bright-field microscope. Algorithms for separation of NEMS, MEMS and background in microscope images based on valley detection, thresholding and masking are demonstrated. |
| Databáze: | OpenAIRE |
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