High-Resolution Distance Dependence Study of Surface-Enhanced Raman Scattering Enabled by Atomic Layer Deposition
| Autor: | Peter C. Stair, Michael O. McAnally, Nicolas Large, George C. Schatz, Ryan A. Hackler, Sicelo S. Masango, Anne Isabelle Henry, Richard P. Van Duyne |
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| Rok vydání: | 2016 |
| Předmět: |
Surface (mathematics)
Chemistry Mechanical Engineering Analytical chemistry High resolution Bioengineering 02 engineering and technology General Chemistry 010402 general chemistry 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences 0104 chemical sciences symbols.namesake Atomic layer deposition Monolayer symbols General Materials Science Nanometre 0210 nano-technology Raman spectroscopy Layer (electronics) Raman scattering |
| Zdroj: | Nano Letters. 16:4251-4259 |
| ISSN: | 1530-6992 1530-6984 |
| Popis: | We present a high-resolution distance dependence study of surface-enhanced Raman scattering (SERS) enabled by atomic layer deposition (ALD) at 55 and 100 °C. ALD is used to deposit monolayers of Al2O3 on bare silver film over nanospheres (AgFONs) and AgFONs functionalized with self-assembled monolayers. Operando SERS is used to measure the intensities of the Al-CH3 and C-H stretches from trimethylaluminum (TMA) as a function of distance from the AgFON surface. This study clearly demonstrates that SERS on AgFON substrates displays both a short- and long-range nanometer scale distance dependence. Excellent agreement is obtained between these experiments and theory that incorporates both short-range and long-range terms. This is a high-resolution operando SERS distance dependence study performed in one integrated experiment using ALD Al2O3 as the spacer layer and Raman label simultaneously. The long-range SERS distance dependence should make it possible to detect chemisorbed surface species located as far as ∼3 nm from the AgFON substrate and will provide new insight into the surface chemistry of ALD and catalytic reactions. |
| Databáze: | OpenAIRE |
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