Nanofabrication on 2D and 3D Topography via Positive‐Tone Direct‐Write Laser Lithography
| Autor: | Jaakko Mastomäki, Zhuoran Geng, Samuli Heiskanen, Ilari Maasilta |
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| Rok vydání: | 2019 |
| Předmět: |
Materials science
lift‐off nanofabrication business.industry nanotekniikka 02 engineering and technology two‐photon absorption 010402 general chemistry 021001 nanoscience & nanotechnology Condensed Matter Physics lasertekniikka 01 natural sciences Two-photon absorption 3d topography direct laser writing 0104 chemical sciences Tone (musical instrument) Nanolithography nanorakenteet Optoelectronics General Materials Science 0210 nano-technology business Maskless lithography positive‐tone resist |
| Zdroj: | Advanced Engineering Materials. 22:1901290 |
| ISSN: | 1527-2648 1438-1656 |
| DOI: | 10.1002/adem.201901290 |
| Popis: | Direct laser writing (DLW) lithography using two‐photon absorption is a powerful technique mostly used for fabrication of complex structures in micro‐ and nanoscale, by photopolymerizing a negative‐tone resist. In contrast, in this study it is demonstrated that DLW is also well suited for fabricating nano‐ to microscale metallic structures using lift‐off and a positive‐tone photoresist. It is shown first that versatile, fast and large area fabrication is possible on flat two‐dimensional insulating substrates, and an expression for how the line width varies with the scanning speed is derived, with excellent agreement with the experiments. Even more interestingly, a unique application for the DLW lift‐off process is demonstrated, by fabricating sub‐micron scale metallic wiring on uneven substrates with sloping elevation changes as high as 20 µm. Such fabrication is practically impossible with more standard lithographic techniques. peerReviewed |
| Databáze: | OpenAIRE |
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