Impact of GaAs(100) surface preparation on EQE of AZO/Al2O3/p-GaAs photovoltaic structures
| Autor: | Marek Godlewski, R. Pietruszka, Jarosław Kaszewski, Krzysztof Kopalko, Katarzyna Gwóźdź, Bartlomiej S. Witkowski, Monika Ozga, Krystyna Lawniczak-Jablonska, Piotr Caban, Ewa Placzek-Popko, Piotr Kuźmiuk |
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| Jazyk: | angličtina |
| Rok vydání: | 2021 |
| Předmět: |
Technology
Materials science Photoluminescence Passivation Scanning electron microscope 020209 energy Science QC1-999 General Physics and Astronomy 02 engineering and technology TP1-1185 Gallium arsenide Atomic layer deposition chemistry.chemical_compound X-ray photoelectron spectroscopy external quantum efficiency Etching (microfabrication) 0202 electrical engineering electronic engineering information engineering General Materials Science Electrical and Electronic Engineering surface passivation business.industry Chemical technology Physics 021001 nanoscience & nanotechnology Ammonium sulfide gallium arsenide photovoltaics chemistry atomic layer deposition Optoelectronics 0210 nano-technology business |
| Zdroj: | Beilstein Journal of Nanotechnology, Vol 12, Iss 1, Pp 578-592 (2021) |
| ISSN: | 2190-4286 |
| Popis: | In order to effectively utilize the photovoltaic properties of gallium arsenide, its surface/interface needs to be properly prepared. In the experiments described here we examined eight different paths of GaAs surface treatment (cleaning, etching, passivation) which resulted in different external quantum efficiency (EQE) values of the tested photovoltaic (PV) cells. Atomic force microscopy (AFM) and scanning electron microscopy (SEM) examinations were conducted to obtain structural details of the devices. X-ray photoelectron spectroscopy (XPS) with depth profiling was used to examine interface structure and changes in the elemental content and chemical bonds. The photoluminescence (PL) properties and bandgap measurements of the deposited layers were also reported. The highest EQE value was obtained for the samples initially etched with a citric acid-based etchant and, in the last preparation step, either passivated with ammonium sulfide aqueous solution or treated with ammonium hydroxide solution with no final passivation. Subsequent I–V measurements, however, confirmed that from these samples, only the sulfur-passivated ones provided the highest current density. The tested devices were fabricated by using the ALD method. |
| Databáze: | OpenAIRE |
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