Spectral line competition in a coaxial electron-beam-pumped high pressure Ar/Xe laser
| Autor: | Lan, Y.F., Peters, P.J.M., Witteman, W.J. |
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| Přispěvatelé: | Laser Physics & Nonlinear Optics, Faculty of Science and Technology |
| Rok vydání: | 1991 |
| Předmět: |
Materials science
Argon Physics and Astronomy (miscellaneous) Gas laser business.industry General Engineering General Physics and Astronomy chemistry.chemical_element Laser Spectral line law.invention Xenon Optics chemistry law Atomic physics Coaxial IR-85901 business Excitation METIS-129663 Power density |
| Zdroj: | Applied physics B: Photophysics and laser chemistry, 52(5), 336-340. Springer |
| ISSN: | 1432-0649 0721-7269 |
| DOI: | 10.1007/bf00325492 |
| Popis: | In order to study the kinetic mechanism of the e-beam pumped Ar/Xe laser, the temporal profiles of individual laser lines during multiline oscillation have been measured as a function of power deposition (1–12MW/cm3) and gas laser pressure (2–14 bar) using a short pulse (30 ns) coaxial electron beam as excitation source. It was found that the optimum output energy at each pressure was obtained at the same specific power deposition. Strong line competition has been observed between the 2.65 and 1.73 μm transitions. In order to explain our results we suggest that besides electron collision mixing (ECM) between the 5d and 6p levels of Xe, there is also a redistribution between all 6p levels which strongly favours the lower levels at higher pumping densities. |
| Databáze: | OpenAIRE |
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