The future of EUV lithography: continuing Moore's Law into the next decade
| Autor: | Jan van Schoot, Kars Zeger Troost, Sascha Migura, Tilmann Heil, Jos Benschop, Hans Meiling, Sjoerd Lok, Jo Finders, Peter Krabbendam, Rob van Ballegoij, Judon Stoeldraijer, Eelco van Setten, Peter Kuerz, Bernhard Kneer, Winfried Kaiser, Frank Bornebroek |
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| Rok vydání: | 2018 |
| Předmět: |
010302 applied physics
Moore's law Computer science Extreme ultraviolet lithography media_common.quotation_subject Volume (computing) 02 engineering and technology 021001 nanoscience & nanotechnology 01 natural sciences law.invention Lens (optics) law 0103 physical sciences Systems engineering 0210 nano-technology Throughput (business) media_common |
| Zdroj: | Extreme Ultraviolet (EUV) Lithography IX |
| DOI: | 10.1117/12.2295800 |
| Popis: | While 0.33NA EUV systems are readying to start volume manufacturing, ASML and Zeiss are ramping up development activities on a 0.55NA EUV exposure tool, extending Moore’s law throughout the next decade. A novel, anamorphic lens design, has been developed to provide the NA; this lens will be paired with new, faster stages and more accurate sensors and the tight focus and overlay control needed for future process nodes. This paper presents an overview of the target specifications, key technology innovations and imaging simulations demonstrating the advantages as compared to 0.33NA and showing the capabilities of ASML’s next generation EUV systems. |
| Databáze: | OpenAIRE |
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