Tunable 2D binary colloidal alloys for soft nanotemplating
| Autor: | Rachel Grange, Ran Ditcovski, Fabio Grillo, Lucio Isa, Tal Ellenbogen, Flavia Timpu, Astrid Rauh, Karen Geisel, Matthias Karg, Gaurasundar M. Conley, Walter Richtering, Frank Scheffold, Roey Elnathan, Miguel Angel Fernandez-Rodriguez, Nicolas H. Voelcker |
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| Rok vydání: | 2018 |
| Předmět: |
Range (particle radiation)
Materials science Silicon Binary number chemistry.chemical_element Nanotechnology 02 engineering and technology 010402 general chemistry 021001 nanoscience & nanotechnology 01 natural sciences Isotropic etching 0104 chemical sciences Colloid chemistry Particle General Materials Science Wetting 0210 nano-technology Nanoscopic scale |
| Zdroj: | Nanoscale. 10:22189-22195 |
| ISSN: | 2040-3372 2040-3364 |
| Popis: | The realization of non-close-packed nanoscale patterns with multiple feature sizes and length scales via colloidal self-assembly is a highly challenging task. We demonstrate here the creation of a variety of tunable particle arrays by harnessing the sequential self-assembly and deposition of two differently sized microgel particles at the fluid-fluid interface. The two-step process is essential to achieve a library of 2D binary colloidal alloys, which are kinetically inaccessible by direct co-assembly. These versatile binary patterns can be exploited for a range of end-uses. Here we show that they can for instance be transferred to silicon substrates, where they act as masks for the metal-assisted chemical etching of binary arrays of vertically aligned silicon nanowires (VA-SiNWs) with fine geometrical control. In particular, continuous binary gradients in both NW spacing and height can be achieved. Notably, these binary VA-SiNW platforms exhibit interesting anti-reflective properties in the visible range, in agreement with simulations. The proposed strategy can also be used for the precise placement of metallic nanoparticles in non-close-packed arrays. Sequential depositions of soft particles enable therefore the exploration of complex binary patterns, e.g. for the future development of substrates for biointerfaces, catalysis and controlled wetting. |
| Databáze: | OpenAIRE |
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