Diamond membranes with controlled stress for submicron lithography
| Autor: | H.-L. Huber, B. Löchel, C.-P. Klages, Lothar Schäfer, L.-M. Buchmann, Andrea Dipl Ing Bluhm |
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| Přispěvatelé: | Publica |
| Jazyk: | angličtina |
| Rok vydání: | 1993 |
| Předmět: |
freitragender Diamantfilm
Fabrication Materials science Nanotechnology free standing diamond film engineering.material X-ray lithography Ion Stress (mechanics) microwave plasma-assisted CVD diamond Materials Chemistry Electrical and Electronic Engineering Lithography Schichtspannung Mechanical Engineering Gasphasenabscheidung Diamond General Chemistry ion projection lithography Microstructure Electronic Optical and Magnetic Materials Röntgenlithographie Membrane chemical vapour deposition Ionenprojektionslithographie engineering film stress Diamant |
| Popis: | X-ray and ion projection lithography use membrane-based masks for the fabrication of microstructures with linewidths below 0.5 μm. To minimize pattern distortions during mask fabrication and under operating conditions, membranes with a high mechanical stability and defined stress are required. Because of its intrinsic properties, diamond should therefore be the membrane material of choice. In this paper we demonstrate that polycrystalline diamond membranes with controlled stress can be produced from chemically vapour-deposited diamond films. The results on properties as well as the compatibility of processing the diamond films with standard lithography equipment encourage the fabrication of diamond-based masks for integration in submicron lithography systems. |
| Databáze: | OpenAIRE |
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