Design of an atomic layer deposition reactor for hydrogen sulfide compatibility

Autor:	A. Bousetta, James F. Mack, Neil P. Dasgupta, Michael C. Langston, Fritz B. Prinz
Rok vydání:	2010
Předmět:	chemistry.chemical_compound Atomic layer deposition Materials science chemistry Chemical engineering Hydrogen sulfide Compressed air Lead sulfide Chemical vapor deposition Chemical reactor Instrumentation Zinc sulfide Leakage (electronics)
Zdroj:	Review of Scientific Instruments. 81:044102
ISSN:	1089-7623 0034-6748
Popis:	A customized atomic layer deposition (ALD) reactor was designed with components compatible with hydrogen sulfide (H(2)S) chemistry. H(2)S is used as a reactant for the ALD of metal sulfides. The use of H(2)S in an ALD reactor requires special attention to safety issues due to its highly toxic, flammable, and corrosive nature. The reactor was designed with respect to materials compatibility of all wetted components with H(2)S. A customized safety interlock system was developed to shut down the system in the event of toxic gas leakage, power outage, loss of building ventilation or compressed air pressure. ALD of lead sulfide (PbS) and zinc sulfide (ZnS) were demonstrated with no chemical contamination or detectable release of H(2)S.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1bb798bb61ffba1a48ceb30593d18e8d https://doi.org/10.1063/1.3384349 Zobrazit plný text záznamu