| Popis: |
In this contribution the requirements and application of organic resist materials in synchrotron lithography are discussed. The physico-chemical reactions in the resists are described on applying the principle of synchrotron lithography, using the available exposure source and its spectrum as well as the absorbing materials. A general survey will be given regarding the presently available resist materials used in synchrotron lithography and semiconductor devices, which are herewith produced |
