High-NA EUV photoresist metrology using high-throughput scanning probe microscopy
| Autor: | Mucientes, Marta, Khachaturiants, Artem, Trussell, Robert, Kalinin, Arseniy, Guo, Yan, Simons, Erik C., Kim, Seokhan, Nadyarnykh, Oleg, Moussa, Alain, Bogdanowicz, Janusz, Severi, Joren, Lorusso, Gian, De Simone, Danilo, Charley, Anne-Laure, Leray, Philippe, van Reijzen, Maarten E., Bozdog, Cornel, Sadeghian, Hamed |
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| Rok vydání: | 2022 |
| Zdroj: | Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology |
| Databáze: | OpenAIRE |
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