Ion beam composition in ion source based on magnetron sputtering discharge at extremely low working pressure

Autor: A. V. Vizir, A. S. Bugaev, V. P. Frolova, V. I. Gushenets, A. G. Nikolaev, E. M. Oks, G. Yu. Yushkov
Rok vydání: 2022
Předmět:
Zdroj: The Review of scientific instruments. 93(4)
ISSN: 1089-7623
Popis: In an ion source based on a pulsed planar magnetron sputtering discharge with gas (argon) feed, the fraction of metal ions in the ion beam decreases with decreasing gas pressure, down to the minimum possible working pressure of the magnetron sputtering discharge. The use of a supplementary vacuum arc plasma injector provides stable operation of the pulsed magnetron sputtering discharge at extremely low pressure and without gas feed. Under these conditions, the pressure dependence of the gaseous ion fraction displays a maximum (is nonmonotonic).
Databáze: OpenAIRE