Interface reactions in Ta/Ni81Fe19/Ta structures and their influence on magnetic properties
| Autor: | W. Y. Lai, Gui Yu, F. W. Zhu, Mei Li, Jiao Teng |
|---|---|
| Rok vydání: | 2005 |
| Předmět: |
Permalloy
Materials science Magnetic moment Metallurgy Metals and Alloys Analytical chemistry Tantalum chemistry.chemical_element Giant magnetoresistance Surfaces and Interfaces Sputter deposition Surfaces Coatings and Films Electronic Optical and Magnetic Materials Exchange bias chemistry X-ray photoelectron spectroscopy Materials Chemistry Thin film |
| Zdroj: | Thin Solid Films. 484:208-214 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/j.tsf.2005.02.031 |
| Popis: | Ta/Fe-81(19), Ni81Fe19/Ta, CuNi81Fe19, and Ni81Fe19/Cu structures are commonly used in the magnetic multilayers with giant magnetoresistance. For a Ta/Ni81Fe19/Ta fundamental structure, Ta seed and Ta cap layers result in a loss of moment equivalent to a magnetically dead layer of thickness 1.6 +/- 0.2 nm. Experimental results show that a chemical reaction between Ta and Ni81Fe19 takes place at the Ta/Ni81Fe19 and Ni81Fe19/Ta interfaces. The thickness of the magnetically dead layer was significantly reduced by the insertion of a small amount of Bi in the Ta/Ni81Fe19/Ta structure (i.e. Ta/Bi/Ni81Fe19/Ta). This result indicates that Bi acts as a surfactant that can suppress the interface reaction in multilayers. For a Cu/Ni81Fe19/Cu film, permalloy layers have hardly lost their magnetic moment since interface reactions at the Cu/Ni81Fe19 interface or Ni81Fe19/Cu interface hardly occurs. (c) 2005 Elsevier B.V. All rights reserved. |
| Databáze: | OpenAIRE |
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