Structure and properties of heteroepitaxial Pb(Zr0.35Ti0.65)O3/SrRuO3multilayer thin films on SrTiO3(100) prepared by MOCVD and RF sputtering

Autor: G. R. Bai, Duane Dimos, Husam N. Alshareef, Roseann Csencsits, Z. Li, C. M. Foster, R. Hiskes, L. A. Wills
Rok vydání: 1995
Předmět:
Zdroj: Integrated Ferroelectrics. 10:31-38
ISSN: 1607-8489
1058-4587
DOI: 10.1080/10584589508012261
Popis: Epitaxial SrRuO3 thin films were deposited on SrTiO3 (100) substrates by RF sputtering for use as bottom electrodes and epitaxial buffer layers. On these conductive substrates, epitaxial Pb(Zr0.35Ti0.65)O3 (PZT) thin films were deposited by metalorganic chemical vapor deposition (MOCVD). X-ray diffraction (XRD), transmission electron microscopy (TEM) and optical waveguiding were used to characterize the phase, refractive index, and film thickness of the deposited films. The epitaxial PZT films were c-axis oriented and contained -19.7% volume fraction of 90° domains. Ferroelectric hysteresis and dielectric measurements of epitaxial PZT ferroelectric capacitor structures formed using sputtered ITO top electrodes showed: a remanent polarization of 51.8 Ω/cm2, a coercive field of 54.9 kV/cm, a dielectric constant of 410, a bipolar resistivity of ∼5.8x109 Ω-cm at a field of 275 kV/cm, and a breakdown strength of >400 kV/cm. The cyclic fatigue behavior of the films showed a strong dependenc...
Databáze: OpenAIRE