Spectral analysis of line width roughness and its application to immersion lithography
| Autor: | Nadia Vandenbroeck, Amir Azordegan, Peter Leunissen, Tony DiBiase, C. Delvaux, Hedong Yang, Gian Francesco Lorusso, Frieda Van Roey, M. Ercken |
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| Rok vydání: | 2006 |
| Předmět: |
Materials science
business.industry Mechanical Engineering Surface finish Condensed Matter Physics Atomic and Molecular Physics and Optics Standard deviation Electronic Optical and Magnetic Materials Metrology law.invention Optics Resist law Process control Electrical and Electronic Engineering Photolithography business Critical dimension Immersion lithography |
| Zdroj: | Journal of Micro/Nanolithography, MEMS, and MOEMS. 5:033003 |
| ISSN: | 1932-5150 |
| DOI: | 10.1117/1.2242982 |
| Popis: | Various approaches can be used to quantify line width roughness (LWR). One of the most commonly used estimators of LWR is standard deviation . However, a substantial amount of information is ignored if only is measured. We use an automated approach to investigate LWR, where standard deviation, correlation length, and power spectrum are measured online on critical dimension scanning electron microscopes. This methodology is used to monitor LWR, investigate the effect of LWR on critical dimension precision, and to benchmark new resists for immersion lithography. Our results indicate that online LWR metrology is a critical tool in a variety of applications, including but not restricted to process control. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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