Autor:	S. L. Wu, Richard C. Tiberio, Lijun Wang, Seng-Tiong Ho
Rok vydání:	1998
Předmět:	Micrometre Nanostructure Materials science Fabrication Nanolithography Etching (microfabrication) Nanotechnology Photomask Nanoscopic scale Electron-beam lithography
Zdroj:	SPIE Proceedings.
ISSN:	0277-786X
DOI:	10.1117/12.318000
Popis:	We show that very narrow fin-like periodic nanostructure with 0.1 micrometer width, 1 micrometer depth, and a few microns length can be fabricated on AlGaAs using Chemically-Assisted- Ion-Beam-Etching with oxidized AlGaAs as negative mask. This technique may have applications to nanoscale devices fabrication.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::f367f7667274c52e78b603b717b1d608 https://doi.org/10.1117/12.318000 Zobrazit plný text záznamu