Density of N2 Active Species in N2 –xCH4 Afterglows with x= (0-7.5)10-4 by Mass Spectrometry and Optical Spectroscopy at Low Gas Pressure

Autor:	A. Ricard, A. M. Diamy, J. C. Legrand
Rok vydání:	2023
Zdroj:	Plasmas Afterglows with N2 for Surface Treatments-Edition 3 ISBN: 9788119217083
DOI:	10.9734/bpi/mono/978-81-19217-08-3/ch25
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::f1a2059c6daa8cb94ee9837bafc60f18 https://doi.org/10.9734/bpi/mono/978-81-19217-08-3/ch25 Zobrazit plný text záznamu