Implementation of integrated real-time multi-sensors on a multi-wafer production MBE system
| Autor: | Yung-Chung Kao, Luan Le, Jared Hubbard, Henry P Lee, Ge Ren, Paul Pinsukanjana, Guang Wang |
|---|---|
| Rok vydání: | 2001 |
| Předmět: |
business.industry
Computer science Process (computing) ComputerApplications_COMPUTERSINOTHERSYSTEMS Nanotechnology Condensed Matter Physics Inorganic Chemistry Semiconductor Materials Chemistry Calibration Electronic engineering Production (economics) Process control Wafer Thin film business Molecular beam epitaxy |
| Zdroj: | Journal of Crystal Growth. :238-243 |
| ISSN: | 0022-0248 |
| DOI: | 10.1016/s0022-0248(01)00690-x |
| Popis: | In situ non-invasive process monitoring and control during semiconductor epitaxy is a potential enabling technology that can transform the existing approach to epi-wafer manufacturing. In this paper, we describe the implementation of a multi-sensor system consisting of both process- and wafer-stage sensors on a multi-wafer production molecular beam epitaxy (MBE) tool. We also illustrate through a few examples how these sensors are used for device and calibration growth. Finally, we will discuss some challenges facing a sensor-based MBE system under a production environment. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full Text from ScienceDirect