High Transmittance TFT-LCD Panels Using Low-$kappa$ CVD Films
| Autor: | Joon-hoo Choi, Byung-keun Hwang, Kwan-Wook Jung, Kyuha Chung, Wan-Shick Hong |
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| Rok vydání: | 2004 |
| Předmět: |
Materials science
Liquid-crystal display Passivation business.industry Chemical vapor deposition Dielectric Electronic Optical and Magnetic Materials law.invention Carbon film Thin-film transistor Plasma-enhanced chemical vapor deposition law Electronic engineering Transmittance Optoelectronics Electrical and Electronic Engineering business |
| Zdroj: | IEEE Electron Device Letters. 25:381-383 |
| ISSN: | 0741-3106 |
| DOI: | 10.1109/led.2004.828957 |
| Popis: | Thin-film transistor liquid crystal display (TFT-LCD) panels of a high transmittance structure were fabricated by using a low-/spl kappa/ dielectric film as a passivation layer. The low-dielectric films were successfully deposited and patterned using a conventional plasma-enhanced chemical vapor deposition (PECVD) and plasma-assisted etching techniques. The interface between the a-Si channel and the overlaying passivation was modified by appropriate plasma treatment prior to the low-/spl kappa/ deposition. TFTs having the a-Si:C:O:H passivation showed a transfer characteristics similar to that of conventional TFTs. The high transmittance panel showed brightness approximately 30% higher than that of a standard panel without degrading other display characteristics, such as crosstalk. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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