(Ti,W,Cr)B2 coatings produced by dc magnetron sputtering
| Autor: | Rainer Telle, A. Newirkowez, B. Cappi, Harald Schmidt |
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| Rok vydání: | 2012 |
| Předmět: |
Materials science
Silicon Annealing (metallurgy) Scanning electron microscope Metallurgy Metals and Alloys Analytical chemistry chemistry.chemical_element Surfaces and Interfaces Sputter deposition Grain size Surfaces Coatings and Films Electronic Optical and Magnetic Materials Amorphous solid chemistry Sputtering X-ray crystallography Materials Chemistry |
| Zdroj: | Thin Solid Films. 520:1775-1778 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/j.tsf.2011.08.071 |
| Popis: | Transition metal diboride coatings of composition (Ti 0.44 W 0.29 Cr 0.27 )B 1.90 were deposited on silicon substrates by dc magnetron sputtering of compound targets. The chemical composition of the targets is transferred to the sputtered films. The as-deposited films are amorphous as indicated by grazing incidence X-ray diffraction. Investigations with electron microscopy revealed that the films show a columnar nano-structure. Annealing at temperatures between 1000 °C and 1300 °C leads to the formation of nano-crystalline precipitations, which can be attributed to (Ti,W,Cr)B 2 , β-(W, Ti, Cr)B and W 2 B 4 phases. Annealing can be used to tailor the average grain size of the precipitates, making these films a good candidate for hard coatings re-enforced by nano-structuring. |
| Databáze: | OpenAIRE |
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