LiBr passivation effect of porous nanocrystalline hydrogenated silicon
| Autor: | Wissem Dimassi, El Whibi Seif, Ikbel Haddadi, Ridha Daik, Rabaa Bousbih, Hatem Ezzaouia, Sana Ben Amor |
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| Rok vydání: | 2015 |
| Předmět: |
Materials science
Passivation Silicon Lithium bromide chemistry.chemical_element Substrate (electronics) Carrier lifetime Condensed Matter Physics Nanocrystalline material chemistry.chemical_compound Chemical engineering chemistry Plasma-enhanced chemical vapor deposition General Materials Science Electrical and Electronic Engineering Layer (electronics) |
| Zdroj: | Superlattices and Microstructures. 88:161-166 |
| ISSN: | 0749-6036 |
| DOI: | 10.1016/j.spmi.2015.09.005 |
| Popis: | Nanocrystalline hydrogenated silicon (nc-Si:H) films were deposited on a p-type silicon substrate by plasma enhanced chemical vapor deposition (PECVD), using SiH 4 and H 2 as reactive gases. Porous (nc-Si:H) layers were afterward obtained and immersed in a lithium bromide (LiBr) aqueous solution in order to enhance their optical and electrical properties for a potential solar cells application. A decrease in the reflectivity to about 9% for Li/porous nc-Si:H layer deposited at 75 sccm against an increase in the minority carrier lifetime were obtained. We correlate these results to the change in crystalline characteristics and chemical composition of the layers in order to understand the effect of LiBr coating on nc-Si:H Through optical and electrical characterization we have demonstrated the possibility of using such LiBr treatment to improve the properties of porous nc-Si:H. |
| Databáze: | OpenAIRE |
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