Selective Pulsed Chemical Vapor Deposition of Water-Free TiO2/Al2O3 and HfO2/Al2O3 Nanolaminates on Si and SiO2 in Preference to SiCOH
| Autor: | James Huang, Yunil Cho, Zichen Zhang, Antony Jan, Keith T. Wong, Srinivas D. Nemani, Ellie Yieh, Andrew C. Kummel |
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| Rok vydání: | 2022 |
| Předmět: | |
| Zdroj: | ACS Applied Materials & Interfaces. 14:15716-15727 |
| ISSN: | 1944-8252 1944-8244 |
| DOI: | 10.1021/acsami.1c19810 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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