Interfacial magnetic coupling in Co/antiferromagnetic van der Waals compound FePS3

Autor: Chin-Shan Lue, Tzu Hung Chuang, Der-Hsin Wei, Po Chun Chang, Alltrin Dhanarajgopal, C. C. Kuo, Chia Nung Kuo, Shi Yu Liu, Wen Chin Lin
Rok vydání: 2021
Předmět:
Zdroj: Applied Surface Science. 567:150864
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2021.150864
Popis: In this study, a Co-thin film was deposited on the van der Waals compound of FePS 3 for the investigation of interfacial magnetic coupling, which is crucial to the application in spintronic devices. As characterized by atomic force microscopy, the exfoliated FePS 3 surface was composed of defects within ± 1 monolayer height. The Co thin film covered the FePS 3 substrate uniformly with a roughness within ± 0.5 nm. The 2 nm-Pd/7 nm-Co/FePS 3 exhibited isotropic magnetism in the surface plane and the magnetic coercivity drastically decreased by more than 50% when the temperature was elevated from 85 K to 110–120 K, which is nearly the Neel temperature of FePS 3 . This observation indicates the interfacial magnetic coupling between Co and FePS 3 . The Co/FePS 3 magnetic coupling is robust even after annealing up to 200 °C. Furthermore, the measurement of X -ray magnetic circular dichroism confirmed the presence of non-compensated Fe moment along the in-plane direction is parallel to the Co magnetization direction. The net Fe-moment is supposed to play an essential role in mediating the magnetic coupling between the in-plane ferromagnetic Co and the perpendicular antiferromagnetic FePS 3 .
Databáze: OpenAIRE