| Autor: |
Shinji Yanaga, Munehiro Ogasawara, Kiminobu Akeno, Noboru Kobayashi, Shinsuke Nishimura, Mitsuko Shimizu, Toru Tojo, Ryuji Hayashi, Soichiro Mitsui, Hideo Kusakabe |
| Rok vydání: |
2002 |
| Předmět: |
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| Zdroj: |
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 20:2640 |
| ISSN: |
0734-211X |
| DOI: |
10.1116/1.1521738 |
| Popis: |
Mask-scan strategy for writing large complex patterns such as oblique lines and contact holes with assist bar and serif is more effective for decreasing the number of shots than is variable shaped beam (VSB) strategy and character projection strategy. In a simple case, the number of shots for writing the oblique lines can be as small as 1/600 of that of VSB strategy. Oblique parallel lines of 250 nm width and assist bar of 120 nm width were projected using the mask-scan strategy. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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