Chemical trimming overcoat: an enhancing composition and process for 193nm lithography
| Autor: | Kevin Rowell, Mingqi Li, Kwang-Hwyi Im, Charlotte Cutler, Cong Liu, Patricia Fallon, Tom Estelle, Hae-Mi Jeong, Gerd Pohlers, Lori Anne Joesten, Irvinder Kaur, Peter Trefonas, Hyun K. Jeon, Wanyi Huang, Paul Baranowski, Wenyan Yin, Cheng Bai Xu, JoAnne Leonard |
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| Rok vydání: | 2016 |
| Předmět: |
Materials science
Extreme ultraviolet lithography Nanotechnology 02 engineering and technology 021001 nanoscience & nanotechnology 01 natural sciences law.invention 010309 optics law 0103 physical sciences Multiple patterning Process window X-ray lithography Photolithography 0210 nano-technology Lithography Next-generation lithography Aerial image |
| Zdroj: | SPIE Proceedings. |
| ISSN: | 0277-786X |
| DOI: | 10.1117/12.2219688 |
| Popis: | As the critical dimension of devices is approaching the resolution limit of 193nm photo lithography, multiple patterning processes have been developed to print smaller CD and pitch. Multiple patterning and other advanced lithographic processes often require the formation of isolated features such as lines or posts by direct lithographic printing. The formation of isolated features with an acceptable process window, however, can pose a challenge as a result of poor aerial image contrast at defocus. Herein we report a novel Chemical Trimming Overcoat (CTO) as an extra step after lithography that allows us to achieve smaller feature size and better process window. |
| Databáze: | OpenAIRE |
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