Plasma sources and characterization in the r.f. test facility

Autor:	J.H Huh, B.C. Kim, J.G Yang, W.S Kim, J.H Choi, N.S Yoon, M.C Kyum, K.-I You, C.M Ryu, D.C Son, S.M. Hwang, J.W Choi, Y.S Chung, S.J Hong, J.H Sim, J Hong, H.K Na, G.S. Lee
Rok vydání:	1999
Předmět:	Materials science Surfaces and Interfaces General Chemistry Plasma Condensed Matter Physics Electron cyclotron resonance Surfaces Coatings and Films Magnetic field Magnetic mirror Helicon Materials Chemistry Plasma diagnostics Atomic physics Inductively coupled plasma Plasma processing
Zdroj:	Surface and Coatings Technology. 112:52-55
ISSN:	0257-8972
Popis:	In order to support the high-power r.f. experiments in the Hanbit large magnetic mirror device and to study low-temperature plasma processing applications, an r.f. test facility (RFTF) was constructed. The RFTF has a total chamber length of 1.5 m, maximum chamber diameter of 0.6 m and maximum magnetic field of 1.2 tesla. In the RFTF, we have studied various plasma sources such as the ICP (inductively coupled plasma), ECR (electron cyclotron resonance), Helicon and ICRH (ion cyclotron resonance heating). From these experiments, we present new experimental results related to a uniform plasma density profile. The characteristics of r.f. (4 MHz) discharges are investigated by using a double half turn antenna with a combination of limiters in a variety of the magnetic field, neutral gas pressures, and applied powers. The results show that the plasma density is uniform over the diameter of 320 mm under a density regime of 10 10 cm −3 .
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::e1331e92f5867058532b050afd1b23de https://doi.org/10.1016/s0257-8972(98)00740-3 Zobrazit plný text záznamu Full Text from ScienceDirect