Organotin in Nonchemically Amplified Polymeric Hybrid Resist Imparts Better Resolution with Sensitivity for Next-Generation Lithography
| Autor: | Jerome Peter, Subrata Ghosh, Satinder K. Sharma, Kenneth E. Gonsalves, Mohamad G. Moinuddin |
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| Rok vydání: | 2020 |
| Předmět: |
Materials science
Polymers and Plastics Process Chemistry and Technology Organic Chemistry Resolution (electron density) Nanotechnology Integrated circuit law.invention Resist law Hardware_INTEGRATEDCIRCUITS Node (circuits) Sensitivity (control systems) Electron-beam lithography Next-generation lithography |
| Zdroj: | ACS Applied Polymer Materials. 2:1790-1799 |
| ISSN: | 2637-6105 |
| DOI: | 10.1021/acsapm.0c00005 |
| Popis: | Given the need for a next-generation technology node in the area of integrated circuits (ICs), improvement in the properties of resist materials, particularly sensitivity (ED), resolution, good etc... |
| Databáze: | OpenAIRE |
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