| Autor: |
Arnaud Mader, Adam Brunton, Klaus Bergmann, Giorgio Pirovano, Giovanni Bianucci, Hans Scheuermann, Peter Zink, Gian Luca Cassol, Fabio Zocchi, Oliver Franken |
| Rok vydání: |
2008 |
| Předmět: |
|
| Zdroj: |
SPIE Proceedings. |
| ISSN: |
0277-786X |
| DOI: |
10.1117/12.772977 |
| Popis: |
The paper presents the results of an investigation into the thermal and optical characteristics of alpha-type dual-mirror grazing incidence collectors for Extreme Ultra-violet Lithography integrated into a tin-fueled discharge produced plasma source. The performance of the system is assessed at various power levels and temperature conditions. The thermal and the optical data, in particular images at extra-focal planes behind the intermediate focus, are compared to the predictions of the thermo-optical model of the system. The data we present provide verification of the models used to design the collector and validation of the thermo-optical modeling approach for design of future generations of collectors. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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