| Autor: |
Edward C. Rea, Keith Hubbard, Luis A. Spinelli, Yefim Kil, Andrea Caprara, Alan Macleod, Stuart Butterworth, Colin Seaton, Tracy F. Thonn |
| Rok vydání: |
2004 |
| Předmět: |
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| Zdroj: |
SPIE Proceedings. |
| ISSN: |
0277-786X |
| DOI: |
10.1117/12.535669 |
| Popis: |
We report on the development and testing of a laser system that delivers up to 200 mW of continuous-wave radiation at 198.54 nm in a near diffraction-limited beam, to be used as a source for photolithography mask writing and mask inspection. The source has been developed with the support of International SEMATECH. The laser output is obtained by intra-cavity sum frequency generation in a CLBO (Cesium Lithium Borate) non-linear crystal |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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