| Autor: |
Wei Xuan Jing, Feng Xia Zhao, Kyle Jiang, Zhuangde Jiang, Philip D. Prewett |
| Rok vydání: |
2010 |
| Předmět: |
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| Zdroj: |
Key Engineering Materials. 437:45-50 |
| ISSN: |
1662-9795 |
| DOI: |
10.4028/www.scientific.net/kem.437.45 |
| Popis: |
Motif parameters were introduced to characterize line edge roughness (LER) of a nanoscale grating structure. Firstly with electron beam lithography employed the expected nano-scale grating structure with linewidth of 16 nm was fabricated on positive resist. Then the line edge profiles of the structure were extracted and their LERs were characterized. The results showed that the evaluation method is rather simple, effective and recommendable. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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