Organometallic chemical vapor deposition of tungsten metal, and suppression of carbon incorporation by codeposition of platinum

Autor:	Herbert D. Kaesz, Burkhard Niemer, Robert F. Hicks, Paul E. Gee, William K. Stovall, Alfred A. Zinn
Rok vydání:	1992
Předmět:	Auger electron spectroscopy Materials science Carbon film Physics and Astronomy (miscellaneous) chemistry Hydrogen Inorganic chemistry chemistry.chemical_element Chemical vapor deposition Thin film Tungsten Platinum Amorphous solid
Zdroj:	Applied Physics Letters. 61:1793-1795
ISSN:	1077-3118 0003-6951
DOI:	10.1063/1.108402
Popis:	Highly reflecting, amorphous, thin films of tungsten are obtained by the decomposition of bis‐cyclopentadienyltungstendihydride, (η‐C5H5)2WH2, in 1 atm of hydrogen at 350 °C. Auger depth profiling reveals that the carbon and oxygen content of the films are 25.1 and 3.1 at. %, respectively. Simultaneous chemical vapor deposition of tungsten with a small amount of platinum reduces the carbon and oxygen content of the film to 5.3 and 1.8 at. %. The platinum is deposited from cyclopentadienylplatinumtrimethyl, (η‐C5H5)Pt(CH3)3, and its concen‐ tration in the film is 3.3%. Annealing at 750 °C in hydrogen converts the tungsten into a polycrystalline deposit which exhibits an x‐ray diffraction pattern characteristic of the metal. The sheet resistivities of the amorphous films are 52±4 μΩ cm.
Databáze:	OpenAIRE
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