Effects of Oxygen Pressure on Sputtered Y-Ba-Cu-O Films

Autor: Mitsumasa Suzuki, M. Komatsu, Hiroshi Morita, C. Takahashi, M. Nagano, Seiya Ogota
Rok vydání: 1992
Předmět:
Zdroj: Advances in Superconductivity IV ISBN: 9784431681977
DOI: 10.1007/978-4-431-68195-3_144
Popis: Films of Y-Ba-Cu-O have been prepared in an argon-oxygen atmosphere by dc magnetron sputtering using a single sintered target with a Ba-poorer composition than stoichiometry. The total gas pressure is 300 mtorr and the oxygen pressure is adjusted in the range of 0.1–10 mtorr. As the oxygen pressure is increased, Ba content in films is highly reduced, although Cu content shows little dependence. The zero resistance transition temperature Tc, end of the best film reaches 89 K. Effects of oxygen pressure on Tc and composition of films are discussed.
Databáze: OpenAIRE