Characteristics of Al2O3/ZrO2 laminated films deposited by ozone-based atomic layer deposition for organic device encapsulation
| Autor: | Joo Hyun Park, Juhong Oh, Giyul Ham, Seokyoon Shin, Hyeongtag Jeon |
|---|---|
| Rok vydání: | 2016 |
| Předmět: |
010302 applied physics
Thin film encapsulation Materials science Ozone Metals and Alloys 02 engineering and technology Surfaces and Interfaces Permeation 021001 nanoscience & nanotechnology 01 natural sciences Surfaces Coatings and Films Electronic Optical and Magnetic Materials Amorphous solid Atomic layer deposition chemistry.chemical_compound Carbon film Chemical engineering chemistry 0103 physical sciences Materials Chemistry Relative humidity Composite material 0210 nano-technology Water vapor |
| Zdroj: | Thin Solid Films. 599:119-124 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/j.tsf.2015.12.044 |
| Popis: | We investigated the characteristics of 100 nm-thick Al 2 O 3 /ZrO 2 laminated films grown by ozone (O 3 )-based atomic layer deposition (ALD) at low temperature (100 °C) as thin film encapsulation (TFE). Calcium (Ca) test was performed at a relative humidity (RH) of 50% with a temperature of 50 °C to derive the water vapor transmission rates (WVTRs) of aluminum oxide (Al 2 O 3 )-, zirconium oxide (ZrO 2 )-, and Al 2 O 3 /ZrO 2 -laminated films. Al 2 O 3 /ZrO 2 -laminated films exhibited better permeation barrier properties than Al 2 O 3 or ZrO 2 single layer films. In Al 2 O 3 /ZrO 2 laminated films, permeation barrier properties improved as the number of alternating layers increased. Permeation barrier properties were closely related to the number of interfaces because of the ZrAl x O y phase that formed at the interface between the Al 2 O 3 and ZrO 2 sublayers. The ZrAl x O y phase was denser than single layers of Al 2 O 3 and ZrO 2 and had a homogeneous amorphous structure. The formation of a ZrAl x O y phase in Al 2 O 3 /ZrO 2 laminated film effectively improved the permeation barrier properties of the film. |
| Databáze: | OpenAIRE |
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